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- Contact Person : Ms. Liu Lucy
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MgF2 Target ceramic target sputtering target
Product Detailed
Related Categories:Metal Coating Machinery
MgF2 Target
Purity: 3N min.
Processing method: Hot press
Relative resistance: 85% min.
Tolerance:+/-0.2mm
MgF2 TargetPurity: 3N min.Processing method: Hot pressRelative resistance: 85% min.Tolerance:+/-0.2mm
Delivery term: 35 days
MgF2 Target ceramic target sputtering target
