Products
- Other Metals & Metal Products[10]
- Silica[5]
- Other Non-Metallic Minerals & Products[7]
- Metal Coating Machinery[7]
- Tungsten Wire[9]
- Metal Processing Machinery Parts[3]
- Other Aluminum[6]
- Aluminum Wire[2]
- Aluminum Coils[1]
- Aluminum Sheets[1]
- Ceramics[3]
- Cast & Forged[10]
- Electrical Contacts and Contact Materials[1]
- Titanium Pipes[1]
- Titanium Bars[1]
- Other Titanium[1]
Contact Us
- Contact Person : Ms. Liu Lucy
- Company Name : Dalian King Choice Non-Ferrous Metals Products Co., Ltd.
- Tel : 86-411-82770123
- Fax : 86-411-82771234
- Address : Liaoning,Dalian,Unit 411, No. 11, Lianjingyuan, Zhongshan District, Dalian City, Liaoning Province, China
- Country/Region : China
- Zip : 116001
Metal Coating Machinery
AZO(ZnO+Al2O3) target ceramic target sputtering target
AZO target
Al2O3:2wt%, 3.13wt%,0.5wt%,or upon request
Purity: 3N~4N
Processing Method: Hot Press
Tolerance: +/-0.2mm
AZO targetAl2O3:2wt%, 3.13wt%,0.5wt%,or upon requestPurity: 3N~4NProcessing Method: Hot PressTolerance: +/-0.2mm Delivery term: 20 days ...
AZO target Ceramic target sputtering target
AZO target
Al2O3:2wt%, 3.13wt%,0.5wt%,or upon request
Purity: 3N~4N
Processing Method: Hot Press
Tolerance: +/-0.2mm
AZO (ZnO+Al2O3)targetAl2O3:2wt%, 3.13wt%,0.5wt%,or upon requestPurity: 3N~4NProcessing Method: Hot PressTolerance: +/-0.2mm Delivery term: 20 days ...
AZO (ZnO+Al2O3) target
AZO target
Al2O3:2wt%, 3.13wt%,0.5wt%,or upon request
Purity: 3N~4N
Processing Method: Hot Press
Tolerance: +/-0.2mm
AZO targetAl2O3:2wt%, 3.13wt%,0.5wt%,or upon requestPurity: 3N~4NProcessing Method: Hot PressTolerance: +/-0.2mm Delivery term: 20 days ...
AZO (ZnO) target
AZO target
Al2O3:2wt%, 3.13wt%,0.5wt%,or upon request
Purity: 3N~4N
Processing Method: Hot Press
Tolerance: +/-0.2mm
AZO targetAl2O3:2wt%, 3.13wt%,0.5wt%,or upon requestPurity: 3N~4NProcessing Method: Hot PressTolerance: +/-0.2mm Delivery term: 20 days ...
MgF2 Target ceramic target sputtering target
MgF2 Target
Purity: 3N min.
Processing method: Hot press
Relative resistance: 85% min.
Tolerance:+/-0.2mm
MgF2 TargetPurity: 3N min.Processing method: Hot pressRelative resistance: 85% min.Tolerance:+/-0.2mmDelivery term: 35 days
...
MgF2 target Ceramic Target used for sputtering
MgF2 Target
Purity: 3N min.
Processing method: Hot press
Relative resistance: 85% min.
Tolerance:+/-0.2mm
MgF2 TargetPurity: 3N min.Processing method: Hot pressRelative resistance: 85% min.Tolerance:+/-0.2mmDelivery term: 35 days
...
IMO(In2O3+MoO3) target Ceramic target sputtering target
IMO Target
Purity: 4N min.
Processing method: Hot press
Relative Density: 85% min.
Tolerance:+/-0.2mm
IMO TargetPurity: 4N min.Processing method: Hot pressRelative Density: 85% min.Tolerance:+/-0.2mmDelivery term: 35days
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