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Boron carbide target ceramic target for sputtering
Product Detailed
Related Categories:Metal Processing Machinery Parts
Boron carbide target
ceramic target
Purity: 90%
Processing method:Hot press
Surface condition: Ground
Boron carbide target
ceramic target Purity: 90%Processing method: Hot pressSurface condition: Ground
Delivery time: 30 days
Boron carbide target ceramic target for sputtering
